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(Click for frequent words.) 76 #μm [002] 75 μm 73 #.#μm [001] 72 #um [002] 72 1μm 70 micrometer 70 5μm 69 2μm 68 #.#um [001] 68 microns 67 1nm 67 micrometre 66 #.#nm [002] 66 mm ² 66 #.#in [004] 65 micron 65 SiO 2 65 Si substrate 65 subwavelength 65 μm diameter 65 #.#mm [002] 65 linewidths 64 μm thick 64 2nm 64 capacitances 64 micron thick 64 5nm 64 #um [001] 63 cm -2 63 submicron 63 nanometers nm 63 cm ² 63 #.#mm [007] 63 #μ 63 micrometer scale 63 ZrO 2 62 QFPs 62 CMOS transistors 62 isotropic 62 microlenses 62 photocurrent 62 nanometric 62 dielectrics 62 hafnium oxide 62 collimators 62 x 9mm 61 mu m 61 2mm 61 micrometres 61 coplanar 61 ZnSe 61 1mm 61 SiO2 61 #.#mm thick [002] 61 z axis 61 FWHM 61 meV 61 #x# mm [004] 61 InGaAs 61 sub micron 61 pMOS 61 #nm laser [001] 61 #nm #nm [002] 61 phototransistors 60 vias 60 #mm ² [001] 60 solder bumps 60 3nm 60 #x#mm [002] 60 angstroms 60 linewidth 60 GaN layer 60 dielectric constants 60 #nm laser [002] 60 polycrystalline 60 #.#mm x [003] 60 optical waveguides 60 dual damascene 60 photoemission 60 nanometers billionths 60 micron diameter 60 x 3mm 60 absorption coefficient 60 dielectric layers 60 microns thick 60 bandgap 60 6mm x 60 particle sizes 60 FinFETs 60 #.#μ 60 waveguides 60 defect densities 60 chipscale 60 #.#mm diameter [002] 60 oxide thickness 60 5mm x 5mm 60 5V CMOS 59 dopant 59 λ 59 x #.#mm [003] 59 heterostructure 59 #mm# [002] 59 #.#x#.#mm 59 #mm# [001] 59 surface roughness 59 x 7mm 59 micrometer thick 59 ink droplet 59 eutectic 59 crystallinity 59 micrometers thick 59 photodiode 59 PIN photodiodes 59 SWCNT 59 6nm 59 epitaxial layer 59 InSb 59 picometers 59 voltage divider 59 parasitic inductance 59 dielectric constant 59 #.#nm [001] 59 x 1mm 59 leadless package 59 nanometers 59 azimuthal 59 7mm x 59 nanomesh 59 #nm #nm [001] 59 wafer thickness 59 subnanometer 59 electron mobility 59 parasitic capacitance 59 TDFN packages 59 3mm x 59 mm2 59 #.#mm x #.#mm [001] 59 resonance frequency 59 zirconium oxide 59 input impedance 59 #mm x #mm [007] 59 CdSe 59 singlemode 59 gate dielectrics 59 LiNbO3 59 MOS transistors 59 silicide 58 nanometers nanometer 58 x #.#mm [005] 58 mrad 58 electrically insulating 58 dI dV 58 dielectric 58 cm -1 58 Ball Grid Array 58 #.#mm x #.#mm [004] 58 #mm x 58 silicon waveguides 58 capacitance values 58 #mm x #mm [001] 58 #x#cm [001] 58 #.#μm [002] 58 4mm x 58 3mm 58 shaft diameters 58 #.# micron node 58 diffracted 58 extrudate 58 PIN photodiode 58 SWNT 58 mm equiv 58 Fig. 2b 58 #.#uF 58 #.#mm [001] 58 collimator 58 picosecond 58 x 4mm 58 numerical aperture NA 58 mm 58 photodetectors 58 photolithographic 58 silicon nitride 58 sq. mm 58 PIN diode 58 silica spheres 58 picoliter 58 #mm x #.#mm [002] 58 #mm ² [002] 58 microcavity 58 #.#mm x #.#mm x [002] 58 gate electrode 58 x 5mm 58 #μm thick [002] 58 AlN 57 wavelength tunability 57 input capacitance 57 dimensional tolerances 57 micrometers 57 #.#mm x #.#mm [003] 57 waveguide 57 BGA packages 57 x 2mm 57 MΩ 57 nm 57 #mV V 57 #x#mm [004] 57 1dB 57 mm BGA 57 passband 57 NiSi 57 6mm 57 DFN packages 57 nitride semiconductor 57 photon counting 57 #pF [001] 57 photon energies 57 k dielectric 57 #.#μF 57 ε 57 femtogram 57 #m/min [002] 57 HRTEM 57 impedance 57 photodetector 57 5mm thick 57 2mm x 2mm 57 Epitaxial 57 micromachined 57 #.#mm x #.#mm [002] 57 #nm wavelength [001] 57 heterojunction 57 5kV 57 lp mm 57 capacitance 57 keV 57 microtubes 57 CCD imagers 57 fused silica 57 silicon substrates 57 transimpedance amplifier 57 SiON 57 nH 57 MWCNTs 57 spherical particles 57 monolayer 57 spacings 57 ± #.#mm [002] 57 #nm [002] 57 × #.#mm [001] 57 x ray beam 57 aluminum nitride 57 CMOS circuits 57 compressive stress 57 oscillation frequency 57 microcavities 57 threshold voltages 57 arcsecond 57 BGAs 57 coercivity 57 nsec 57 dielectric materials 57 UV absorbance 57 dipole moment 57 1kHz 57 LTPS TFT 57 inductance 57 underfill 57 RGB pixels 57 picoseconds 57 resistive element 57 anisotropic 57 wirebond 57 oxide thickness EOT 57 bandpass filter 57 GaN wafers 57 optically transparent 57 TiN 57 Bragg grating 57 stripline 57 undoped 57 ferrite 57 microstrip 56 conformality 56 cm2 56 antiparallel 56 epiwafers 56 Schottky barrier 56 numerical aperture 56 optically coupled 56 #.#mm x [001] 56 anisotropy 56 μS cm 56 martensite 56 5mm x 56 InAs 56 kΩ 56 g/m2 56 absorbance 56 1mm thick 56 planar 56 monodisperse 56 AlGaN 56 #.#mm [005] 56 nm nodes 56 manganite 56 HEMT 56 PBGA package 56 microlens 56 EMIF# 56 transconductance 56 DFN package 56 #mm# [003] 56 #.#dB [003] 56 anneal 56 #ksps 56 silicon atoms 56 photonic crystal 56 Schottky diode 56 magnetic permeability 56 Fig. 3b 56 solder bump 56 indium gallium arsenide InGaAs 56 WLCSP 56 cm ^ sup 56 ± #.#dB 56 zener diodes 56 #.#-# mm 56 GPa 56 Voltages 56 Fig. 3A 56 dispersive 56 thermal EMF 56 measuring #.#mm x [001] 56 refractive index 56 dielectric layer 56 transistor arrays 56 thermal conductivities 56 pin BGA package 56 ratiometric 56 tensile stress 56 diffracting 56 Fig. 1A 56 bandpass 56 piezo ceramic 56 conductive epoxy 56 galvo 56 microlens array 56 Fabry Perot 56 collimated 56 #μF [001] 56 pentacene 56 planarity 56 thermally stable 56 diameters 56 biaxial 56 photonic bandgap 56 milliohm 56 SOI CMOS 56 outer diameters 56 silicon nanowire 56 planarization 56 #.#dB [002] 56 2dB 56 toroids 56 electrophoretic 56 mΩ 56 coating thickness 56 inhomogeneities 56 tetragonal 56 copper metallization 56 micromirror 56 × #mm [002] 56 Nova NanoSEM 56 conductance 56 interferometric 56 concentricity 56 aspheric 56 HfSiON 56 Fig. 1a 56 pin TSSOP 56 SiC substrates 56 thermo mechanical 56 Cpk 56 emission wavelength 56 InN 56 ultra telephoto zoom 56 leakage currents 56 Z axes 56 monochromator 56 R# #/kg [001] 56 #Ω [002] 56 transmittance 56 fluorescence detection 56 EMCCD 56 coplanarity 56 MESFET 56 FBGA package 56 mm × 56 MoS2 56 photoluminescence 56 ferrite core 56 aspheres 56 FinFET 56 nonpolar GaN 56 surface mountable 56 diffract 56 InGaN 56 angstrom 56 g cm 56 substrate 56 PHEMT 55 η 55 aspherical 55 MWNT 55 singlemode fiber 55 #.#mm #.#mm [003] 55 #x#mm [005] 55 WL CSP 55 linearly polarized 55 #pF [002] 55 nanoliter 55 #mm x #mm [006] 55 breakdown voltages 55 pulse durations 55 OP# [003] 55 m 55 through silicon vias 55 micron pixels 55 f#.# f#.# 55 QFNs 55 TSSOP 55 nm CMOS 55 3mm thick 55 SO8 55 bending radii 55 ZnS 55 micrometer sized 55 linear encoder 55 ellipsometry 55 #x# mm [003] 55 wavelength tunable 55 JFET 55 Interferometric 55 AlGaAs 55 microfabricated 55 magnifications 55 Young modulus 55 pF 55 x 3cm 55 HMC#LP#E 55 Nd YAG 55 6mm x 6mm 55 diffractive 55 DEV DA TOMAR NEXT 55 5mm x 6mm x 55 resonators 55 transmissivity 55 superlattice 55 stencil printing 55 nMOS 55 multilayers 55 x ray scattering 55 microns millionths 55 P3HT 55 copper interconnects 55 nematic 55 nanoribbons 55 x 7cm 55 arcseconds 55 overmolded 55 4mm thick 55 #.#mx #.#mx #.#m 55 singulated 55 kcal mol 55 diode arrays 55 Tunable 55 m z 55 excitation wavelengths 55 photomultipliers 55 ppm ° C 55 icosahedral 55 absorption spectra 55 submicrometer 55 photomultiplier tubes 55 Fig. 4b 55 microvolts 55 #:#.#-#.# 55 aspherical lens 55 CMOS fabrication 55 Yb 55 electron scattering 55 imprint lithography 55 3 x 3mm 55 millimeter diameter 55 NWs 55 ohm cm 55 5mm 55 GaAs pHEMT 55 photon beams 55 μF 55 piezo actuators 55 CMOS wafers 55 C0G 55 #ohm [001] 55 TQFP packages 55 mosfet 55 millimeter 55 magnon 55 μl 55 bandgaps 55 6GHz 55 pellicle 55 #-#,# mm 55 UV VIS 55 cermet 55 solder bumping 55 PNP transistors 55 nanocrystalline 55 SDS PAGE 55 TDFN package 55 paramagnetic 55 QFN packages 55 #/#-in [001] 55 scintillator 55 optical waveguide 55 ± #.#mm [001] 55 Aluminum Nitride 55 crystallites 55 RDS ON 55 millivolts 55 fluorescence emission 55 diffraction limit 55 SMT LEDs 55 diffraction grating 55 Josephson junction 55 #.#pF 55 Flip Chip 55 planar waveguide 55 x 6mm 55 THz radiation 55 MQW 55 photon fluorescence 55 elastic modulus 55 ps nm 55 femtosecond pulse 55 capacitive loading 54 reticles 54 silicon Si 54 strontium titanate 54 longitudinal axis 54 microfocus 54 SiGe C 54 BGA CSP 54 Å -1 54 multilayer ceramic 54 Fine Crossbred Indicator 54 geometries 54 crystal lattices 54 PIN diodes 54 SiGe bipolar 54 #.#mm x [002] 54 mH 54 ferrites 54 low k dielectrics 54 crystalline Si 54 ^ sup -1 54 mV 54 conformal 54 cuvettes 54 detector arrays 54 lasing wavelength 54 ferromagnetic 54 Mosfet 54 thinner wafers 54 film transistors TFTs 54 indium gallium arsenide 54 conductivities 54 8mm diameter 54 lattice mismatch 54 dB insertion loss 54 nanotube bundles 54 interferometers 54 connectorized 54 micro SMD package 54 x 2in 54 QCLs 54 pn junction 54 mm thick 54 photobleaching 54 cantilever deflection 54 carbides 54 mm LFCSP 54 3mm x 3mm 54 x #mm [002] 54 passivation layer 54 millimeters mm 54 CdS 54 nm wavelength 54 interdigitated 54 metallisation 54 3mm x 3mm x 54 #.#mm thick [003] 54 pin QFN 54 ZnO 54 modulus 54 bipolar transistors 54 magnetostrictive 54 #.#mm# [002] 54 substrates 54 SOT# [002] 54 polariton 54 Al#O# 54 shorter wavelengths 54 SWNTs 54 nm wavelengths 54 photonic circuits 54 photonic crystal fiber 54 GaAs substrate 54 arcsec 54 HEMTs 54 electron density 54 PZT 54 SMA connectors 54 instrumentation amplifier 54 capacitively coupled 54 SOIC package 54 diffraction 54 nonmagnetic 54 luminous flux 54 toolholder 54 x 8mm 54 #mV [001] 54 temperature coefficients 54 microlitre 54 MSOP packages 54 #/#-inch [002] 54 Brillouin zone 54 Mosfets 54 electron bunches 54 semiconducting 54 leadless 54 YAG lasers 54 aspheric lens 54 atomically smooth 54 laminations 54 PEDOT PSS 54 capacitive coupling 54 silicon substrate 54 HV# [003] 54 x #.#mm [001] 54 avalanche photodiodes 54 7 x 7mm 54 SAXS 54 wire bondable 54 nanopositioning stages 54 BGA package 54 QSOP 54 milliampere 54 GaAs MESFET 54 Josephson junctions 54 #nm immersion 54 Vdd 54 W mK 54 Viewing Angle 54 UNCD 54 pearlite 54 micron thickness 54 inductances 54 sub picosecond 54 radii 54 micrometre scale 54 fluorescence intensity 54 cadmium selenide 54 Measuring #mm [002] 54 e beam lithography 54 ohmic 54 barium titanate 54 Gaussian beam 54 ENOB 54 pigment particles 54 3Xnm 54 #.#mm diameter [001] 54 thermopile 54 fA 54 HfO2 54 nanochannels 54 ms -1 54 mounting flange 54 hollow cylinders 54 unpolarized 54 illuminance 54 OSNR 54 Fig. 1D 54 linear axes 54 linearized 54 ARPES 54 panchromatic 54 #pin [001] 54 X7R 54 SAR ADC 54 millimeter mm 54 variable resistor 54 nanometers thick 54 circular dichroism 54 nm VCSEL 54 interfacial layer 54 horizontally polarized 54 cadmium sulfide 54 SOT# [001] 54 kVp 54 APTIV film 54 NMR spectra 54 ± #V [001] 54 AFM probes 54 #.# micron CMOS 54 Î ¼ 54 polystyrene spheres 54 reflowed 54 #.#Hz 54 √ Hz 54 pore diameters 54 epitaxy HVPE 54 1mm x 1mm 54 SOI wafer 54 photodiodes 54 MOS transistor 54 electrically conductive 54 tiny 3mm x 54 TOSAs 54 confocal laser scanning 54 nanorod 54 SWCNTs 54 PE# [001] 54 telephoto focal 54 nanoribbon 54 ultrananocrystalline diamond 54 Fig. 2A 54 1ppm 54 analyte 54 ohmic contacts 54 mT 54 mJ 54 nanodots 54 κ 54 #ns [002] 54 lanthanum aluminate 54 CIGS Copper Indium 53 submillimeter 53 multimode optical fiber 53 perpendicular magnetic 53 DS DBR 53 velocity dispersion 53 indium gallium phosphide InGaP 53 #x#mm [003] 53 photonic crystal fibers 53 QDs 53 optically pumped 53 MBd 53 hexamers 53 chemiluminescence 53 frequency comb 53 palladium Pd 53 echogenic 53 ultrabright 53 NMOS 53 pin 4mm x 53 antiferromagnetic 53 Fig. 1c 53 Silicon Nitride 53 x #dpi [002] 53 QFN# package 53 Femtosecond 53 silicon waveguide 53 apertures 53 1W LED 53 LVDT 53 friction coefficients 53 hexagonal lattice 53 nanometer scale 53 self assembled monolayer 53 antireflective 53 optical encoder 53 GaN layers 53 W/cm2 53 multicrystalline cells 53 Figure 4a 53 #.#mV 53 electron diffraction 53 3mm DFN package 53 #ppm ° C 53 χ 53 pin TDFN package 53 2mm x #.#mm 53 #.#VI O 53 #μs [002] 53 VCOs 53 parasitic capacitances 53 Z axis 53 QFN packaging 53 PQFP 53 mm DFN package 53 nm excitation 53 bilayer graphene 53 mV V 53 #nm [003] 53 #.#x magnification [001] 53 bypass capacitors 53 Nanometer 53 #.#mx #.#m [002] 53 terahertz waves 53 impedances 53 femtosecond 53 TFTs 53 8kV 53 DFB lasers 53 pin SOIC packages 53 mm QFN 53 Vsby 1 53 MeV 53 Angstroms 53 nanoindentation 53 LVCMOS 53 thermal impedance 53 x #.#in [002] 53 Si TFT 53 pixel 53 semiconducting material 53 interposer 53 linearization 53 absolute TCR 53 nitrided 53 calcium fluoride 53 #Ω [001] 53 colorimetry 53 nanometer wavelength 53 nanofabricated 53 candelas per 53 μsec 53 mK 53 birefringence 53 μL 53 compressive strain 53 #x# dpi [001] 53 1kV 53 picoliter droplets 53 tunable filters 53 singulation 53 monolayers 53 5mm x 6mm 53 electroluminescence EL 53 lamella 53 -# dB [001] 53 FDSOI 53 μW 53 heterostructures 53 magnetic separator 53 pre preg 53 D2PAK 53 Micromorph 53 #.#mm x [004] 53 megohms 53 perovskite 53 3dB 53 4mm x 4mm 53 micromachining 53 magnetron sputtering 53 indium tin oxide ITO 53 low k dielectric 53 ADA# 53 chip resistors 53 Exoscan 53 doped silicon 53 amorphous silicon Si 53 PMOS transistors 53 photoresists 53 QMEMS 53 X ray microscopy 53 GaP 53 integral nonlinearity INL 53 LVDTs 53 graphene nanoribbons 53 #.#x zoom 53 gauss 53 lowpass filter 53 femtosecond pulses 53 ring resonator 53 bypass capacitor 53 aluminum oxide 53 pin SOIC 53 beamsplitters 53 nanotubes nanowires 53 quasiparticle 53 Laser VCSEL 53 Cu Cu 53 wph 53 #/#Hz [001] 53 gate dielectric 53 brightfield 53 flexures 53 τ 53 creepage 53 megapascals 53 overmolding 53 electron volt 53 #.#Ω 53 absorption spectroscopy 53 crystallographic 53 orbitals 53 microchannel plate 53 +# micron 53 #x#mm package 53 electron emitters 53 Focused Ion Beam 53 x 5cm 53 Fig. 1b 53 pin TSSOP package 53 ink droplets 53 indenter 53 UV inkjet printers 53 photon detection 53 magnetization 53 electrons emitted 53 oxide semiconductor 53 inhomogeneous 53 4mA 53 capacitive sensors 53 Cu interconnects 53 refractive indices 53 #x#dpi 53 #MSPS 53 #nm nodes 53 Transmission electron microscopy 53 Schottky 53 deformable mirrors 53 reactive ion 53 collagen fibrils 53 photodiode arrays 53 mm QFN package 53 #mm x #mm [005] 53 bright F#.# 53 monofilaments 53 halftone 53 lightwaves 53 7mm x 7mm 53 amorphous silicon 53 ferritic 53 hysteresis loop 53 Gaussian filter 53 nanoholes 53 collinear 53 incremental encoders 53 pin TQFP 53 inductance values 53 semiconducting nanowires 53 toroid 53 micrometre sized 53 chromatic dispersion 53 emitting lasers 53 AlGaN GaN 53 thicknesses 53 reflectometry 53 semiconductor nanowires 53 parylene 53 thermally conductive 53 #x#x# mm [002] 53 f/#.# f/#.# 53 #us [001] 53 msec 53 Scanning Probe Microscopes 53 #AWG 53 anodic 53 epitaxial layers 53 inhomogeneity 53 #GHz [001] 53 diplexers 53 advanced leadframe 53 pore sizes 53 submillimetre wavelengths 53 femtosecond lasers 53 #μF [002] 53 4H SiC 53 8mm x 8mm 53 pin LQFP 53 #kN [001] 53 transparent conductive coatings 53 ohm load 53 LQFP 53 polyimide 53 frequency harmonics 53 antimonide 53 ESD protection 53 electron beam 53 YBCO 53 rms jitter 53 photon flux 53 Micrometer 52 3 mm DFN 52 superparamagnetic 52 beam splitter