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(Click for frequent words.) 73 photomasks 70 lithography 69 photomask 69 photoresist 67 e beam lithography 66 imprint lithography 66 optical lithography 65 silicon wafers 65 photolithographic 65 nanolithography 65 lithographic 64 silicon wafer 64 nano imprint 64 semiconductor wafers 64 Photolithography 64 computational lithography 63 photoresists 63 epitaxy 63 EUV lithography 63 electrodeposition 63 micromachining 63 ion implantation 62 immersion lithography 62 nanoimprint 62 EUV masks 62 microfabrication 62 #nm immersion 62 micro optics 62 CMOS wafer 62 micro machining 61 deep ultraviolet DUV 61 BEOL 61 vapor deposition 61 indium tin oxide ITO 61 electron beam lithography 61 nanofilm 61 extreme ultraviolet lithography 61 millimeter silicon wafers 61 nanometer scale 60 nanometer 60 silicon substrates 60 nanoimprint lithography NIL 60 mask aligners 60 optical coatings 60 Lithography 60 metallization 60 nano patterning 60 sputter deposition 60 photonic devices 60 wafer 60 nano imprint lithography 59 nanocrystal 59 nanoimprinting 59 silicon 59 CMOS transistors 59 SOI CMOS 59 transparent conductive 59 glass substrate 59 micromachined 59 reactive ion 59 flexible substrates 59 focused ion beam 59 optical waveguides 59 optical metrology 59 microelectronic devices 59 amorphous silicon Si 59 #nm lithography [001] 59 indium tin oxide 59 substrates 59 epi wafers 59 CMOS fabrication 59 wafer metrology 59 dielectrics 59 EUV 59 nanoarrays 59 epitaxial 58 microcontact printing 58 logic CMOS 58 plasma etching 58 #.#μm [002] 58 PZT 58 FEOL 58 metallisation 58 dielectric etch 58 dye sublimation 58 ion beam 58 transistor circuits 58 CMOS 58 UV NIL 58 ownership CoO 58 plasma etch 58 ArF immersion lithography 58 inorganic LEDs 58 lithographic techniques 58 quantum dot 58 nanopatterning 58 CMP slurries 58 pulsed laser deposition 58 CMOS processes 58 epitaxial deposition 58 BiCMOS 58 MOS transistors 58 x ray optics 58 wafer bonder 57 extreme ultra violet 57 planarization 57 gallium nitride 57 nanoimprint lithography 57 hydride vapor phase 57 nanoscale structures 57 electron beam 57 Aera2 57 dielectric materials 57 ZnSe 57 Indium Phosphide 57 transistor 57 EUVL 57 UVTP 57 microlithography 57 wafer bonding 57 maskless lithography 57 wafer bumping 57 lithographic patterning 57 nm lithography 57 silicon substrate 57 sub micron 57 sol gel 57 Si substrates 57 planar 57 FinFET 57 silicon etch 57 film transistors TFTs 57 EBDW 57 Silicon Germanium 57 silicon chips 57 #nm #nm [005] 57 copper interconnects 57 inkjet printing 57 gallium nitride GaN 57 lithographic processes 57 semiconductor wafer 57 wafer thinning 57 polycrystalline 57 wafer dicing 57 silica spheres 57 AFMs 57 gallium arsenide 57 ArF 57 nanoparticle inks 57 Grätzel cells 56 physical vapor deposition 56 anneal 56 nitride 56 semiconductor fabrication 56 nanometric 56 electron beam welding 56 semiconductor 56 indium phosphide 56 PECVD 56 barium titanate 56 pellicle 56 Tetra Reticle Clean 56 photolithographic techniques 56 passivation 56 embedded nonvolatile memory 56 GaN LEDs 56 semiconducting materials 56 AlGaAs 56 nanoantenna 56 nanodevice 56 metrology 56 through silicon vias 56 transparent electrode 56 substrate 56 photopolymer 56 photonic crystal 56 aspheric 56 annealing 56 gate dielectrics 56 nanoscale 56 opto electrical 56 CMOS silicon 56 silicon germanium 56 X ray microscopy 56 phototransistors 56 dielectric layers 56 SiGe bipolar 56 CMOS compatible 56 electroplating 56 low k dielectrics 56 aluminum nitride 56 laser scribing 56 nm node 56 CMP consumables 56 TFPV 56 silicon nanocrystals 56 photodiode 56 photodetectors 56 nitride semiconductor 56 Vertical Cavity Surface Emitting 56 metallic inks 56 VCSELs 56 indium gallium arsenide InGaAs 56 #.# micron CMOS 56 SOI wafers 56 nanostructure 56 microelectromechanical systems MEMS 56 CMOS oscillators 56 quantum dots 56 bipolar transistors 56 deep sub micron 56 reticle inspection 55 nonlinear optical 55 SOI wafer 55 chemical vapor deposition 55 wafer processing 55 superlattice 55 ferroelectric 55 silicon waveguide 55 mechanical polishing CMP 55 TSVs 55 insulator wafers 55 #nm node [001] 55 smaller geometries 55 electrophoretic 55 2Xnm 55 fluorescent probes 55 cathode materials 55 optical microscopy 55 mask aligner 55 strontium titanate 55 graphene layers 55 Transparent Conductive Oxide TCO 55 CIGS cells 55 solder bumping 55 Photomask 55 semiconductor lithography 55 vertical cavity 55 optically transparent 55 argon fluoride 55 SiON 55 CMOS logic 55 superlens 55 gate dielectric 55 CMP slurry 55 hafnium oxide 55 optical microscopes 55 transmission electron microscopes 55 organic TFTs 55 millisecond anneal 55 MEMS resonators 55 THz radiation 55 bistable 55 epitaxy HVPE 55 solar cells 55 indium phosphide InP 55 CVD etch 55 indium arsenide 55 indium gallium arsenide 55 extreme ultraviolet EUV 55 deep submicron CMOS 55 excimer lasers 55 nanostructures 55 sapphire substrate 55 Microfluidic devices 55 chalcogenide 55 encapsulants 55 #mm silicon wafers 55 Complementary Metal Oxide Semiconductor 55 monochromator 55 bismuth telluride 55 silicide 55 c Si 55 nm DRAM 55 chalcogenide glass 55 reticles 55 microstructures 55 #.# micron node 55 GaN 55 Rapid prototyping 55 fused deposition 55 conductive coatings 55 transistor arrays 55 InGaN 55 nanofabrication 55 low k dielectric 55 solder bump 55 antireflective coatings 55 metal oxide 55 silicon transistors 55 spintronic devices 54 ultraviolet curable 54 CIGS solar cells 54 submicron 54 polymeric materials 54 antifuse 54 spintronic 54 etching DRIE 54 DEV DA TOMAR NEXT 54 #nm [002] 54 wafer thickness 54 micrometer scale 54 nano fabrication 54 correction OPC 54 Photonic crystals 54 nanomechanical 54 nanomagnets 54 dimensional nanostructures 54 scanning electron microscopes 54 QuantumFilm 54 Aerosol Jet 54 EUV mask 54 LiNbO3 54 VUV 54 #nm silicon 54 Stratasys FDM 54 XT #i 54 III nitride 54 gallium arsenide gallium nitride 54 k gate dielectric 54 Insulator SOI 54 CVD diamond 54 Raman spectroscopy 54 polymer coatings 54 Strained silicon 54 solder paste 54 amorphous silicon 54 line BEOL 54 maskless 54 brightfield 54 nanowire arrays 54 Esatto Technology 54 overlay metrology 54 #nm CMOS [002] 54 CIGS 54 piezo ceramic 54 Focused Ion Beam 54 k dielectric 54 deep submicron 54 photochromic 54 silicon CMOS 54 Gallium Arsenide 54 silicon micromachining 54 SOI silicon 54 ion implant 54 LTPS TFT 54 opto electronic 54 sintering 54 leadframe 54 #.#um [001] 54 pn junctions 54 UV curing 54 carbon nanotube 54 microscopy techniques 54 CIGS solar cell 54 nanowire 54 Raman lasers 54 photonic crystals 54 microdevices 54 etch deposition 54 #mm wafer 54 AFM probes 54 nanometer silicon 54 subwavelength 54 manganite 54 high-k/metal gate 54 dimensional metrology 54 fused quartz 54 nanoribbons 54 MEMS 54 Silicon wafers 54 quartz oscillators 54 nanometer lithography 54 wafer probing 54 Cadmium Telluride CdTe 54 overmolding 54 Czochralski 54 high voltage BCDMOS 54 nanofabrication techniques 54 PolyJet Matrix TM 54 wafer uniformity 54 gold nanoclusters 54 conformal coatings 54 microstructured 54 microcavity 54 ion implanters 54 SiC 54 transparent conductive coatings 54 SWCNT 54 toner particles 54 patterning 54 silicon oxide 54 microlenses 54 silicon nitride 54 defect densities 54 zeolite membranes 54 nanostructured materials 54 HEMT 54 SUSS 54 STT RAM 54 dopant 54 RFCMOS 54 silicon carbide 54 leadframes 54 photoresist strip 54 nanoantennas 54 phosphors 53 nanoporous 53 MALDI 53 liquid crystal 53 #nm [001] 53 gate electrode 53 nm nodes 53 encapsulant 53 laser irradiation 53 nanocrystalline 53 microfabrication processes 53 SiGen 53 magnetic nanoparticle 53 ultraviolet laser 53 microfluidics 53 furnaceware 53 nanoelectronic 53 nanodots 53 Angstron 53 #nm nodes 53 parasitic extraction 53 3Xnm 53 #nm node [002] 53 ellipsometry 53 micro electromechanical systems 53 electrospinning 53 nanoscale dimensions 53 TFTs 53 Clear Shape 53 lithography simulation 53 PolyJet 53 evanescent wave 53 microfabrication techniques 53 pMOS 53 microfluidic 53 micrometer thick 53 nm wavelength 53 ultrasonic welding 53 DNA origami 53 ITRS roadmap 53 chemical mechanical planarization 53 crystallinity 53 nm immersion 53 insulator substrate 53 epiwafer 53 nanometer node 53 nanostructured 53 silicon nanowires 53 micron 53 ZnS 53 Novellus SABRE 53 electron mobility 53 metamaterial structures 53 stencil printing 53 nanotubes nanowires 53 monolithic microwave integrated 53 optical spectroscopy 53 nanostructuring 53 metallic nanostructures 53 copper metallization 53 pHEMT 53 microelectronic components 53 SiC substrates 53 multilayers 53 1μm 53 scatterometry 53 Chemical Vapor Deposition CVD 53 die bonders 53 photon fluorescence 53 shorter wavelengths 53 InGaAs 53 Thin Film Transistor 53 backside metallization 53 quartz plates 53 Molecular Imprints 53 #nm #nm [002] 53 spectroscopic methods 53 #mm wafers 53 microfluidic chips 53 fiber lasers 53 CO2 lasers 53 scanning electron microscope SEM 53 AlGaN GaN 53 InP 53 additive fabrication 53 polymer substrates 53 .# micron 53 nanometers nm 53 photomultipliers 53 underfill 53 mask ROM 53 epitaxial layer 53 BinOptics 53 RRAM 53 deep silicon etch 53 bandgap 53 numerical aperture 53 planar transistors 53 lithographically 53 helium ion 53 CdSe 53 optoelectronic 53 carbon nanotubes 53 silicon photovoltaics 53 LPCVD 53 solar concentrator 53 extruded profiles 53 polyimide 53 oxide layer 53 projected capacitive touch 53 nitriding 53 silicon foundries 53 photodetector 53 EDXRF 53 Opti Probe 53 carbon nanotubes CNT 53 qdots 53 waveguides 53 electrospinning technique 53 HKMG 53 wafers 53 zinc selenide 53 silicon germanium SiGe 53 heterostructures 53 nanophotonic 53 UMC #nm 53 conductive inks 53 SWIR cameras 53 dye sensitized 53 QMEMS 53 LSA#A 53 darkfield 53 laser sintering 53 MESFET 53 excimer 53 resin infusion 53 String Ribbon 53 Gallium Nitride 53 deformable mirror 53 photonic 53 magnetron sputtering 53 Carbon nanotube 53 LightScribe discs 53 monocrystalline silicon 52 nematic 52 diffraction 52 micromirror 52 epitaxial graphene 52 copper indium gallium diselenide 52 aluminum oxide 52 DFEB 52 microfluidic devices 52 MEMS fabrication 52 silicon germanium SiGe BiCMOS 52 confocal microscope 52 carbon nanotube transistors 52 nanowires 52 transparent conductive films 52 layer deposition ALD 52 semiconductor nanowires 52 nanopatterns 52 geometries 52 graphene 52 silicon carbide SiC 52 inkjet printhead 52 photorefractive polymer 52 #nm immersion lithography 52 Immersion lithography 52 porous silicon 52 boron nitride 52 tungsten filament 52 nickel silicide 52 photopolymers 52 defectivity 52 Gallium Arsenide GaAs 52 ATMI 52 frequency comb 52 picosecond lasers 52 laser ablation 52 PVD CVD 52 microcapillary 52 di selenide CIGS 52 microdisplay 52 DRIE 52 photoresist stripping 52 superlenses 52 nano imprinting 52 solder reflow 52 microcavities 52 ultrafast laser 52 semiconducting 52 density interconnect HDI 52 nm CMOS process 52 #nm lithography [002] 52 laser diode module 52 engineered substrates 52 collimating 52 GaAs substrates 52 photoluminescence 52 PEDOT 52 PCB layout 52 optical tweezers 52 DPN ® 52 nanomembranes 52 Semiconducting 52 transistor leakage 52 sapphire wafers 52 semiconducting properties 52 #nm CMOS [001] 52 ZnO nanowires 52 semiconductor nanocrystals 52 photomask inspection 52 crystalline semiconductors 52 deflashing 52 Resistive Random Access 52 germanium substrates 52 laser annealing 52 nanochannel 52 Situ Hybridization FISH 52 scanning tunneling microscopy 52 epitaxial structures 52 conductive epoxy 52 nano scale 52 EVG# 52 thermo mechanical 52 CIGS copper indium 52 solder paste printing 52 barium ferrite 52 CMOS circuits 52 transparent conductive oxides 52 Sanger sequencing 52 quantum cascade lasers 52 Nova NanoSEM 52 nanofluidics 52 conformal coating 52 laser interferometers 52 UV curable 52 aluminum gallium arsenide 52 multilayer 52 stereolithography 52 silicon Si 52 CMOS sensors 52 dielectric 52 aluminum arsenide 52 electron beams 52 solder mask 52 DSSCs 52 semiconductor CMOS 52 metallic interconnects 52 titanium oxide 52 aspherical lens 52 oxide semiconductor 52 colloidal crystals 52 Calibre LFD 52 EUV resists 52 CMOS wafers 52 PHEMT 52 photonic bandgap 52 thermal inkjet 52 IQ Aligner 52 outcoupling 52 coating thickness 52 OLED displays 52 nanowire transistors 52 multichip 52 epiwafers 52 FineSim SPICE 52 organic photovoltaics 52 Si substrate 52 nanometers 52 copper indium gallium selenide 52 electron scattering 52 k gate dielectrics 52 UV cured 52 SUSS MicroTec 52 silicon MEMS 52 NOVeA 52 conductive polymer 52 carbon nanotube CNT 52 epitaxial layers 52 nanobelts 52 nanocubes 52 printed circuit 52 dip pen nanolithography 52 diffractive optical elements 52 synchrotron X ray 52 antireflection 52 lenses prisms 52 photodiode arrays 52 VCSEL 52 virtual prototyping 52 epitaxial wafers 52 conformal 52 package SiP 52 hyperlens 52 MEMS oscillator 52 film transistor TFT 52 JEOL 52 CCD detector 52 microbolometers 52 Double Patterning 52 optical 52 numerical aperture NA 52 excimer laser 52 ceramic powders 52 AlN 52 Microfluidic 52 Epitaxial 52 Novellus Systems Inc NVLS.O 52 photochemical 52 offset litho 52 ALLVIA 52 ink jet 52 electrochemical deposition 52 monodisperse 52 SiGe C 52 InAs 52 graphene sheets 52 DongbuAnam 52 picosecond 51 inorganic semiconductors 51 titanium carbide 51 ultraviolet LEDs 51 nano coatings 51 lithium niobate 51 crystalline silicon 51 electrochemical 51 diffraction pattern 51 CMOS circuitry 51 Quantum dots 51 silicon nanoparticles 51 collimators 51 nanopatterned 51 InSb 51 microfabricated 51 #nm SOI 51 DPSS lasers 51 VECTOR Express 51 microbatteries 51 ECPR 51 polymeric 51 nanoscale patterning 51 SOI Silicon 51 Alanod Solar 51 nanometer transistors 51 CMOS MEMS 51 #.#μm CMOS 51 quantum cascade 51 conventional photolithography 51 nm 51 laser diodes 51 solder bumps 51 thermally conductive 51 plasmonic devices 51 SOI MEMS 51 UV curable ink 51 millisecond annealing 51 deburring 51 thermal oxidation 51 bond aligner 51 C4NP 51 tunable lasers 51 pulsed lasers 51 pultrusion 51 capillary electrophoresis 51 String Ribbon solar 51 electron microscopy 51 diffraction gratings 51 nanodevices 51 MOS transistor 51 immersion litho 51 crystalline silicon c 51 diffractive 51 fused silica 51 nonvolatile memories 51 NuFlare 51 semiconductors 51 Organic light emitting 51 cadmium telluride CdTe 51 deconvolution 51 femtosecond laser pulses 51 inkjet inks 51 programmable logic devices 51 inkjet printing systems 51 #.#um CMOS 51 DualBeam 51 mm wafers 51 photonic circuits 51 femtosecond lasers 51 #nm/#nm 51 zinc oxide nanowires 51 PVD coating 51 ion traps 51 electroformed 51 Powder coating 51 ferro electric 51 GaN layers 51 diodes LEDs 51 nm CMOS 51 nanometer nm 51 Ion implantation 51 tin oxide 51 hafnium dioxide 51 nanopowders 51 IGBT Insulated Gate 51 laser micromachining 51 nano particle 51 electroforming 51 nanophotonics 51 femtosecond laser 51 microelectronics fabrication 51 ion microscope 51 fluorescent molecules 51 polymer membranes 51 etching 51 electroluminescence 51 photocatalysts 51 scanning tunneling microscope STM 51 fluorescence detection 51 Laser VCSEL 51 SOI substrate 51 surface functionalization 51 Diode OLED 51 reflow compatible 51 corneal flap 51 purity silicon 51 UV LED 51 conductive ink 51 amorphous silicon TFT 51 Indium Phosphide InP 51 microelectromechanical 51 dielectric layer 51 battery anodes 51 titania 51 K dielectrics 51 electron spins 51 UV curing inks 51 micromachines 51 GaN wafers 51 ReRAM 51 nanofilms 51 rigid substrate 51 inch wafers 51 block copolymer 51 emitting lasers 51 flexo plates 51 TMOS display 51 cadmium telluride 51 Applied Baccini 51 metallic nanoparticles 51 SOI substrates 51 machining 51 GaN substrates 51 anisotropic 51 microfluidic chip 51 InN 51 nanoelectronic devices 51 ultrahigh resolution 51 Flex OneNAND 51 diffraction grating 51 functionalizing 51 insert molding 51 DRAM SRAM 51 laterally diffused metal 51 electrochromic 51 scintillator 51 semiconductive 51 ultrashort pulses 51 indium gallium nitride InGaN 51 microscale 51 HVPE 51 composite resins 51 Plasmonic 51 Cadmium Telluride 51 PIN diodes 51 vibrational spectroscopy 51 cuvette 51 GaAs substrate 51 Dip Pen Nanolithography ® 51 terahertz imaging 51 surface texturing 51 CdTe Si 51 diffraction limit 51 Silicon dioxide 51 nano composites 51 selective emitter 51 UNCD Horizon 51 Extreme Ultraviolet EUV 51 indium gallium phosphide 51 nm SRAM 51 bipolar transistor 51 CMOS IC 51 diode laser 51 AlGaN 51 Gigaphoton 51 optical lattices 51 Si wafers 51 #μm thick [002] 51 electron optics 51 reticle enhancement 51 colloidal crystal 51 ultrafast lasers 51 flexographic plates 51 microstrip 51 nanofluidic 51 Richard Brilla CNSE 51 ASML lithography 51 AquiVia 51 nanostructured silicon 51 ultra violet UV 51 ferromagnetic materials 51 PEDOT PSS 51 polymer substrate 51 flex circuits 51 line FEOL 51 Raman spectrometer 51 Amorphous silicon 51 #nm geometries 51 triple quadrupole 51 nanotube 50 CBT resin 50 nanometer CMOS 50 monolithic CMOS 50 pulsed laser beam 50 OLEDs 50 quantum cascade laser 50 dual damascene 50 HfO2 50 silicon nanowire 50 polarizers 50 conductive adhesives 50 micrometre 50 polycrystalline diamond 50 Thin Film Transistors 50 self assembled monolayer 50 PolyMax 50 polymer nanocomposites 50 opto mechanical 50 HamaTech APE 50 indium gallium nitride 50 silicone carbide 50 etchers 50 ultraviolet lasers 50 eutectic 50 Silicon wafer 50 microchannel plate 50 photorefractive 50 SMS NIL 50 CdTe 50 lamination 50 spectral imaging 50 cemented carbide 50 Aprio Technologies Inc. 50 polymer membrane 50 aligned carbon nanotubes 50 femtosecond pulse 50 multilayer ceramic capacitors MLCC 50 AMLCD 50 doped silicon 50 ferroelectrics 50 thinner wafers 50 crystalline silicon photovoltaic 50 nanocluster 50 Soitec produces 50 TSMC #nm process 50 Quantum Dot 50 bioimaging 50 Silicon CMOS Photonics 50 polymer 50 optical components 50 mm wafer 50 GaN transistors 50 heterostructure 50 wirebond 50 antireflective coating 50 e beam DFEB 50 ultraviolet UV 50 Dektak 50 SiC wafers 50 solder pastes 50 PIN diode 50 brightness light emitting 50 Nanoimprint lithography 50 crystal lattices 50 Germanium 50 gold nanorods 50 beam splitters 50 voltage CMOS 50 laser interferometer 50 X ray diffraction microscopy 50 silicon photonic 50 poly Si 50 nanosilicon