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(Click for frequent words.) 68 computational lithography 68 photolithographic 67 photolithography 67 imprint lithography 66 nanoimprint 66 maskless lithography 66 nanolithography 66 mask aligner 66 nanoimprint lithography NIL 66 x ray optics 66 X ray microscopy 65 nano patterning 65 optical waveguides 65 nano imprint lithography 65 EBDW 65 mask aligners 65 .# micron 65 manganite 65 lithography 65 metallisation 65 electron beam lithography 65 Photolithography 65 ellipsometry 65 photoresist 64 nanopatterning 64 CMOS fabrication 64 extreme ultraviolet lithography 64 Rapid prototyping 64 #nm immersion 64 submicron 64 BEOL 64 optical lithography 64 EUV lithography 64 SiGe bipolar 64 Silicon Germanium 63 nanoindentation 63 nanoimprinting 63 UV NIL 63 lithographic processes 63 photoresists 63 correction OPC 63 EUV mask 63 indium gallium arsenide InGaAs 63 photonic devices 63 singulation 63 nm CMOS process 62 TestKompress 62 Double Patterning 62 electrodeposition 62 nano imprint 62 transistor arrays 62 Si substrate 62 MEMS resonators 62 pMOS 62 micromachining 62 CMOS transistors 62 nm lithography 62 EVG# 62 transparent conductive 62 nm immersion 62 oxide semiconductor 62 reed switches 62 Fourier transform infrared 62 wafer bonder 62 brightfield 62 epitaxy HVPE 62 reactive ion 62 GammaTag 62 indium tin oxide ITO 62 #μm thick [002] 62 dielectric etch 62 darkfield 62 defect densities 61 MOS transistors 61 FEOL 61 voltage CMOS 61 spectral imaging 61 photodetectors 61 low k dielectrics 61 monochromator 61 CMOS oscillators 61 SOI CMOS 61 metallization 61 #nm silicon 61 electron optics 61 CMOS compatible 61 overmolding 61 titanium carbide 61 lithographic 61 Opti Probe 61 defectivity 61 microstrip 61 fluorescence detection 61 triple quadrupole 61 XT #i 61 wafer metrology 61 immersion lithography 61 photomasks 61 hydride vapor phase 61 silicon waveguide 61 indium phosphide InP 60 5μm 60 D8 DISCOVER 60 FinFET 60 photopolymer 60 epitaxy 60 dielectrics 60 Nova NanoSEM 60 nanolayers 60 deep silicon etch 60 conductive epoxy 60 ownership CoO 60 superlattice 60 EUVL 60 microstructured 60 nanomechanical 60 SiON 60 nitride semiconductor 60 transparent electrode 60 microscopy techniques 60 nanoarrays 60 metallic inks 60 microbolometer 60 tunable filter 60 lithographic patterning 60 picosecond lasers 60 silicon germanium SiGe 60 PROLITH 60 extreme ultra violet 60 nanofilm 60 CRIUS 60 lithography simulation 60 HRTEM 60 temporary wafer bonding 60 nanotubes nanowires 60 EDXRF 60 nonlinear optical 60 scatterometry 60 reflow solder 60 microcontact printing 60 antireflective coatings 60 EUV resists 60 wirewound 60 lithographic techniques 60 VUV 60 carbon nanotube CNT 60 indium gallium arsenide 60 photoluminescence 60 #nm lithography [001] 60 epi wafers 60 SOPC Builder 60 vapor deposition 60 surface functionalization 60 nanopositioning 60 5V CMOS 60 #nm nodes 60 absorption spectroscopy 60 nanoantenna 60 photoresist stripping 60 planar transistors 60 optical metrology 60 organic TFTs 60 UVTP 59 nanometer CMOS 59 nanometer lithography 59 dielectric materials 59 nm nodes 59 Sanger sequencing 59 EUV masks 59 CCD detector 59 MOS transistor 59 Agilent SurePrint 59 FE SEM 59 photomultipliers 59 optical microscopy 59 reflectometry 59 pulsed laser deposition 59 focused ion beam 59 monodisperse 59 hardcoat 59 nanofabrication techniques 59 CMOS logic 59 silicon photonic 59 SOI substrates 59 #nm CMOS [002] 59 X Ray Diffraction 59 capacitive touch sensor 59 deep sub micron 59 vibrational spectroscopy 59 BGA packaging 59 Dektak 59 reticle inspection 59 overlay metrology 59 3Xnm 59 FT IR 59 microfabrication 59 pellicle 59 #nm lithography [002] 59 thermal conduction 59 QMEMS 59 scintillator 59 nanometric 59 spectroscopic techniques 59 deep submicron 59 capillary electrophoresis 59 microcavity 59 III nitride 59 SAXS 59 multiphoton 59 thermo mechanical 59 Arria GX FPGAs 59 LiNbO3 59 epiwafers 59 silicon photovoltaics 59 dimensional nanostructures 59 line BEOL 59 bipolar transistors 59 piezo ceramic 59 Complementary Metal Oxide Semiconductor 59 DEV DA TOMAR NEXT 59 superlenses 59 millimeter silicon wafers 59 piezo actuators 59 optically pumped 59 WS CRDS 59 OLED microdisplay 59 photodiode arrays 59 nanowire transistors 59 transistor circuits 59 Silicon Germanium SiGe 59 micro machining 59 reticles 59 GxT 59 rheometer 59 nanopositioning stages 59 MEMS fabrication 59 phototransistors 59 #nm immersion lithography 59 MALDI 59 opto electrical 59 scanning electron microscopes 59 aspheric 59 EMCCD 59 leadframe 59 tunable filters 58 ReRAM 58 JENOPTIK GmbH 58 scanning microscopy 58 eutectic 58 nanocrystal 58 Strained silicon 58 diffractive optical elements 58 aspherical lens 58 magnetron sputtering 58 conductive inks 58 micromirror 58 scanning electron microscope SEM 58 Force Microscopy 58 layer deposition ALD 58 nematic 58 edge roughness LER 58 wafer dicing 58 through silicon vias 58 #nm #nm [002] 58 Scanning Electron Microscope SEM 58 conductive adhesive 58 threshold voltages 58 numerical aperture 58 solder mask 58 Imprio 58 FeRAM 58 copper interconnects 58 InSb 58 MALDI-TOF/TOF 58 ActiPix D# 58 k dielectric 58 C4NP 58 unclonable 58 APTIV film 58 e beam DFEB 58 X ray absorption spectroscopy 58 DSSCs 58 spectroscopic methods 58 surface plasmon resonance SPR 58 PIN photodiode 58 #nm node [001] 58 subwavelength 58 nm wavelengths 58 1μm 58 lenticular lens 58 SiC substrates 58 CMOS processes 58 piezo actuator 58 LTPS TFT 58 sputter deposition 58 wafer uniformity 58 micromachined 58 AFMs 58 dimensional metrology 58 stereolithography SLA 58 Aera2 58 BiCMOS 58 industrial inkjet printing 58 photodiode array 58 TOF TOF 58 indium tin oxide 58 #.# micron CMOS 58 Lithography 58 Foveon X3 58 outcoupling 58 antireflection 58 polishing pads 58 monolithic CMOS 58 micro vias 58 infrared emitters 58 electron beams 58 inkjet printhead 58 GaN transistors 58 photorefractive polymer 58 quantitative proteomics 58 copper metallization 58 wirebond 58 chalcogenide 58 planarization 58 Photonic crystals 58 GenISys 58 micromechanics 58 #nm wavelength [001] 58 femtosecond laser pulses 58 Fast Fourier Transform FFT 58 nanocubes 58 RFCMOS 58 photopolymers 58 UV curable ink 58 MALDI MS 58 laser micromachining 58 k gate dielectrics 58 metallic interconnects 58 Mixed Signal IC 58 NPFLEX 58 parasitic inductance 58 3D LUTs 58 mass spectrometry MS 58 Sentaurus 58 anneal 58 aluminum nitride 58 wafer prober 58 deep submicron CMOS 58 nm immersion lithography 58 CMOS wafer 58 sub micron 58 Altera FPGAs 58 nanofabricated 58 microfabrication techniques 58 #nm photomask 58 electrically insulating 58 epitaxial structures 58 digitisers 57 magnetostrictive 57 parasitic extraction 57 Optical Coherence Tomography 57 Scanning Probe Microscopy 57 Focused Ion Beam 57 k gate dielectric 57 parameterisation 57 PEDOT PSS 57 planar 57 etching DRIE 57 multiphoton microscopy 57 QCLs 57 hermetic packaging 57 Aerosol Jet 57 millisecond annealing 57 photomask inspection 57 surface mountable 57 silicon Si 57 nanometer silicon 57 interposers 57 silicon interposer 57 ferrite beads 57 GaN transistor 57 hafnium oxide 57 DDR PHY 57 JTAG port 57 semiconducting materials 57 monolithically integrated 57 electroluminescence EL 57 InAs 57 backside illumination 57 FDSOI 57 Nanoindentation 57 FD SOI 57 zinc selenide 57 nanoimprint lithography 57 Exoscan 57 heterojunctions 57 k dielectrics 57 Flow cytometry 57 AlGaAs 57 microcapillary 57 multiphoton imaging 57 Dip Pen Nanolithography ® 57 x ray pulses 57 wafer thickness 57 laser scanning confocal 57 High Voltage CMOS 57 GaAs PHEMT 57 nanoparticle inks 57 terahertz imaging 57 CyberDisplay #K 57 QT# [001] 57 LSA#A 57 PolyJet Matrix TM 57 InN 57 dielectric layers 57 silicon substrates 57 MAX# integrates 57 photon counting 57 CFD simulations 57 graphene circuitry 57 package SiP 57 deep ultraviolet DUV 57 optical coherence tomography OCT 57 superconducting qubit 57 ferro electric 57 AFM probes 57 chemically amplified 57 DRIE 57 Electron beam 57 NovaMARS 57 epitaxial layer 57 embedded nonvolatile memory 57 superlens 57 underfill 57 interposer 57 microfocus 57 IQ Aligner 57 solderable 57 2Xnm 57 pulsed lasers 57 DFEB 57 #.#μm [001] 57 UNCD 57 multilayers 57 UV lasers 57 Immersion Lithography 57 PEEK OPTIMA 57 CPU emulation 57 coater developer 57 microcavities 57 transparent conductive coatings 57 dual damascene 57 fluorescence excitation 57 nanocrystalline 57 stripline 57 microlithography 57 PCR primer 57 TCAD Sentaurus 57 silicon nanowire 57 microfluidic chips 57 laser scribing 57 XFP module 57 NdFeB 57 ZnSe 57 plasma etching 57 carbon nanotube arrays 57 InGaAs 57 MRFM 57 nano fabrication 57 passivation 57 SiliconSmart ACE 57 SiPs 57 boundary scan 57 optical spectroscopy 57 NiSi 57 Foundation fieldbus 57 fused silica 57 CIGS Copper Indium 57 nano particulate 57 liquid crystal polymer 57 #nm laser [002] 57 photonic crystal fibers 57 DfM 57 conformal coating 57 frequency combs 57 high voltage BCDMOS 57 EUV resist 57 Logic Navigator 57 PIN photodiodes 57 PolyJet 57 supercritical fluids 57 programmable SoC 57 analog circuitry 57 CMOS 57 ABS M#i 57 reflective polarizer 57 biophysical techniques 57 confocal 57 HV CMOS 57 Patterning 57 ARPES 57 electrochemical detection 57 rotary encoder 57 photodiode 57 GaN layers 57 Magma Talus 57 nanometer node 57 SDDs 57 ECPR 57 piezoresistive 57 InGaN 57 laser sintering 57 additive fabrication 57 Absorption Spectroscopy 57 ChIP chip 57 Helios XP 57 gate dielectrics 57 silicide 57 Conformal 57 design kits PDKs 57 spectroscopic ellipsometry 57 polymer coatings 57 microelectronic devices 57 electron multiplying 56 HPLC-Chip/MS 56 Flex OneNAND 56 silicon MEMS 56 Dynabeads 56 substrates 56 FinFETs 56 Thin Film Transistors 56 coating thickness 56 nanoelectronic devices 56 CIGS solar cells 56 massively parallel sequencing 56 thermally conductive 56 collimators 56 Raman spectrometer 56 multiplexed assays 56 quantum cascade 56 synchrotron X ray 56 plasma mass spectrometry 56 sensor arrays 56 ArF immersion lithography 56 Micro Piezo 56 liquid chromatograph 56 scintillators 56 powder diffraction 56 toolpath generation 56 PHEMT 56 nanoporous 56 conductive plastics 56 multichip 56 nanoelectronics photonics 56 Xilinx FPGA 56 synthesizable IP 56 immersion litho 56 frequency comb 56 ion traps 56 Carbon nanotube 56 chalcogenide glass 56 ARM#EJ processor 56 3Gb s SDI 56 numerical aperture NA 56 planar CMOS 56 Indium Phosphide 56 confocal imaging 56 pHEMT 56 spherical lens 56 carbon nanotubes CNT 56 hyperspectral imager 56 zinc oxide ZnO 56 wavelength ultraviolet 56 nanophotonic 56 selective soldering 56 confocal laser scanning 56 APiX 56 high-k/metal gate 56 irreversible electroporation IRE 56 micro optics 56 nanowire arrays 56 table LUT 56 dispersive 56 multilayer ceramic capacitors 56 photon detection 56 QorIQ processors 56 monolithic microwave integrated 56 parasitic capacitance 56 Flexar 56 hyperlens 56 microlens array 56 ENIG 56 FTIR spectrometer 56 chemometric 56 ion beams 56 resistive element 56 interferometry 56 #nm #nm [005] 56 UV VIS 56 SQUIDs 56 nanoparticle arrays 56 absorber layer 56 triple quadrupole mass spectrometers 56 Mask Aligner 56 laser diode module 56 porous membrane 56 UCC# 56 silicon Mach Zehnder 56 HBLEDs 56 millisecond anneal 56 x ray tomography 56 picosecond laser 56 RFID inlay 56 correlative microscopy 56 amorphous silicon Si 56 RRAM 56 logic CMOS 56 metallic nanostructures 56 electrospray ionization 56 UV curable 56 SiliconSmart 56 BiFET 56 inkjet printing 56 rheological 56 reflow soldering 56 tolerancing 56 benchtop instrument 56 Powder coating 56 line FEOL 56 Nanometer 56 TiN 56 athermal 56 microdevices 56 DongbuAnam 56 conventional photolithography 56 CVD etch 56 #.# micron node 56 Adaptive optics 56 microfabricated 56 nanostructured surfaces 56 spectrophotometric 56 optical encoder 56 stencil printing 56 selective emitter 56 CIGS solar cell 56 transistor scaling 56 optical waveguide 56 displacement chromatography 56 nonpolar GaN 56 kit PDK 56 digital halftone 56 particle sizing 56 FPCs 56 Structured ASICs 56 motion adaptive deinterlacing 56 electrospinning 56 bioimaging 56 backside metallization 56 PCB layout 56 Raman spectroscopic 56 nanoscale patterning 56 polycrystalline diamond 56 TDK EPC 56 spiral inductors 56 IR spectroscopy 56 VCSELs 56 SmartFactory system 56 AlN 56 isolated flyback 56 electron tunneling 56 photomultiplier 56 nanocomposite materials 56 ceramic capacitor 56 Capillary Electrophoresis 56 Transparent Conductive Oxide TCO 56 Vertical Cavity Surface Emitting 56 silicon CMOS 56 nm CMOS 56 lattice mismatch 56 impedance measurements 56 nitride 56 microplate format 56 micromechanical 56 quantum cascade lasers 56 K dielectrics 56 calorimetric 56 photoactivation 56 electroformed 56 telecentric lenses 56 ASML lithography 56 JFET 56 SOFC stacks 56 detector arrays 56 SWCNT 56 indium gallium nitride InGaN 56 solder bump 56 Specman Elite 56 di selenide CIGS 56 adaptive equalization 56 planar waveguide 56 TetraMAX ATPG 56 MetaPULSE 56 stereolithography 56 digitizers 56 injection moldable 56 Gallium Nitride 56 excitonic 56 ultrasonic welding 56 donor acceptor 56 8bit MCUs 56 opto mechanical 56 flexo printing 56 #um [002] 56 extreme ultraviolet EUV 56 nanoflow 56 sol gel 56 bond aligner 56 subnanometer 56 SOI MEMS 56 exfoliated graphene 56 X ray microanalysis 56 self assembled monolayer 56 terahertz spectroscopy 56 photonic circuits 56 Fourier transform 56 mass spectrometric analysis 56 nm DRAM 56 optical sectioning 56 germanium substrates 56 cuvette 56 HEMTs 56 photonic crystal 56 photodetector 56 ultrasonic transducers 56 near infrared NIR 56 sapphire substrate 56 polymer substrates 56 TQFP package 56 optical biosensor 56 MTS# 56 laser triangulation 56 linewidths 56 parameter estimation 56 wafer thinning 56 CCD imagers 56 spectroscope 56 HfO2 56 piezoelectric transducer 56 Gaussian beam 56 deformable mirrors 56 SAW oscillators 56 Varistors 56 protein adsorption 56 nMOS 56 Plasmonic 56 optically coupled 56 LabChip 56 ChemetriQ 56 leadless package 56 epitaxial deposition 56 CO2 lasers 56 Talus Vortex 56 IDEAL Contex 56 lithographically 56 photomask 56 smaller geometries 56 conductive polymer 56 photocatalysts 56 electron scattering 56 rotationally symmetric 56 flexo gravure 56 THz radiation 56 #nm CMOS [001] 56 semiconductor fabrication 56 viscosity measurements 56 dielectric layer 56 x ray fluorescence 56 SWIR cameras 56 thermally activated 56 nanofabrication 56 conductivities 56 aspheric lens 56 patterning technique 56 CIGS photovoltaic PV 56 JTAG emulation 56 nanoparticle characterization 56 Thin Film Transistor 55 electron beam 55 collinear 55 Fourier domain 55 Dual Frequency 55 diffractive optics 55 Stratasys FDM 55 transparent conductive oxides 55 engineered substrates 55 nanocomposite material 55 ProFire Excel 55 #nm VCSEL [001] 55 nm VCSEL 55 metrology 55 GaN LEDs 55 Impinj AEON 55 Selective Laser Sintering SLS 55 crystalline semiconductors 55 electroless 55 VIISta 55 electromagnetic simulation 55 film transistors TFTs 55 Scanning Laser 55 insert molding 55 OP# [003] 55 bioelectronic 55 SiMoA 55 #.#μm [002] 55 silicon etch 55 RTL verification 55 X ray detectors 55 CMOS scaling 55 embedded passives 55 #.#μ 55 ZnS 55 nanochannel 55 carbon nanotube transistors 55 Strained Silicon 55 oxynitride 55 EUV 55 #nm SOI 55 solder bumps 55 MSn 55 Cortex M3 core 55 projected capacitive touch 55 bandgaps 55 microlasers 55 HEMT 55 aCGH 55 electron beam welding 55 glass substrate 55 Micromorph 55 spectroscopic technique 55 TFT Thin Film 55 TSVs 55 solder pastes 55 OSTAR ® 55 mmWave 55 gate electrode 55 IGBT Insulated Gate 55 sequential clock gating 55 microshutters 55 indium phosphide 55 Nanoimprint lithography 55 extruded profiles 55 #nm geometries 55 nickel silicide 55 z axis 55 Pattern Matcher 55 haplotyping 55 nanoelectromechanical 55 leakage currents 55 BioScope II 55 DualBeam 55 deconvolution 55 silicon germanium 55 micro fluidic 55 linear encoder 55 inkjet printers UV 55 nanofilms 55 STT RAM 55 conformal coatings 55 nanocoating 55 NMR spectrometers 55 shearography 55 vNIC 55 planarity 55 microreactors 55 uniaxial strain 55 UV LED 55 solder reflow 55 HORIBA Jobin Yvon 55 laser diode modules 55 induced fluorescence 55 hexamers 55 curve tracer 55 Situ Hybridization FISH 55 piezoelectric actuator 55 electret 55 intermetallic 55 Josephson junctions 55 UMC #nm 55 parametrics 55 NuFlare 55 TFTs 55 interferometric 55 metamaterial structures 55 Insulator SOI 55 mesoscopic 55 Ansoft Designer 55 capacitive sensor 55 wire bondable 55 UltraFLEX 55 FPGA architectures 55 fluorescence spectroscopy 55 silica spheres 55 #.#um [001] 55 coplanar 55 laser diffraction 55 dye sublimation 55 Metrology System 55 lensless imaging 55 argon fluoride 55 maskless 55 nanoscale structures 55 FT IR spectroscopy 55 CMOS circuits 55 Raman scattering 55 RealTime Designer 55 toolholder 55 micro electromechanical 55 nanodots 55 galvanometer 55 SMS NIL 55 #.#μm CMOS process 55 ion implantation 55 AVR microcontrollers 55 PIN diode 55 downconverter 55 radiotracers 55 geometries shrink 55 ferroelectrics 55 magnetic nanoparticle 55 CBT resin 55 colorimetry 55 chip SoCs 55 F3D 55 microdevice 55 NanoTime 55 UHR TOF 55 foil resistor 55 crystalline Si 55 taggant 55 eWLB technology 55 nanometer 55 gallium indium arsenide 55 wafer probing 55 Stratix III FPGAs 55 nanodevice 55 Epitaxial 55 multijunction 55 X ray diffraction XRD 55 solder alloys 55 high-k/metal gate HKMG 55 antireflective coating 55 QuickCap NX 55 DXF file 55 ARM#E S core 55 optical coatings 55 GaN wafer 55 PVD coating 55 tribological 55 femtosecond lasers 55 serial EEPROMs 55 BCDMOS 55 Qspeed diodes 55 semiconductor metrology 55 compact benchtop 55 Ion Trap 55 colorimetric 55 flexible substrates 55 Surface Acoustic Wave 55 FineSim Pro 55 Cadence SoC Encounter 55 lenticular lenses 55 CMOS imager 55 mass spectrometric 55 ELISAs 55 x ray microscopy 55 titanium sapphire 55 heterogeneous catalysts 55 UV Visible 55 semiconducting properties 55 QFN packages 55 photoemission spectroscopy 55 polycrystalline 55 jitter clocks 55 solution processable 55 DPN ® 55 conjugated polymers 55 Differential Signaling 55 8bit MCU 55 '# patent relates 55 mTouch 55 laser annealing 55 mechanical polishing CMP 55 polymer substrate 55 BGA CSP 55 electromagnetic flowmeter 55 Self Assembled 55 conductive adhesives 55 ANTARES 55 dielectric constants