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(Click for frequent words.) 78 EUV lithography 77 EUV 72 extreme ultraviolet lithography 71 extreme ultraviolet EUV 68 lithography 68 immersion lithography 67 EUV resists 66 nanoimprint 66 Lithography 65 imprint lithography 64 computational lithography 64 maskless lithography 63 nano imprint 63 optical lithography 63 EUV resist 63 #nm node [001] 63 ArF immersion lithography 63 nm node 63 EUV mask 62 SEMATECH 62 nm lithography 62 #nm immersion 61 extreme ultra violet 60 e beam lithography 60 nm immersion 60 EUV masks 59 UV NIL 59 NuFlare 58 photomask 58 3D TSV 58 photomasks 58 Gigaphoton 58 Double Patterning 58 nano imprint lithography 58 XT #i 58 #/#nm 58 nanoimprint lithography 58 reticle inspection 57 ArF 57 EUV Lithography 57 photolithography 57 Photomask 57 high-k/metal gate 57 dielectric etch 57 Extreme Ultraviolet EUV 57 DFEB 57 CIGS 57 FinFETs 57 photoresist 56 nanolithography 56 #nm immersion lithography 56 deep ultraviolet DUV 56 photoresists 56 TSVs 56 Aera2 56 nano patterning 56 EVG# 56 #nm nodes 56 #nm lithography [001] 56 SPIE Advanced Lithography 55 Photolithography 55 k gate dielectrics 55 SOI CMOS 55 smaller geometries 55 silicon photovoltaics 55 maskless 55 PROLITH 55 photomask inspection 55 3Xnm 55 C4NP 55 wafer bonding 55 ITRS roadmap 55 Molecular Imprints 55 Immersion Lithography 54 nanoimprint lithography NIL 54 nanometer node 54 lithographic 54 TFPV 54 wafer bonder 54 metallization 54 nanopatterning 54 Extreme Ultra Violet 54 VUV 54 2Xnm 54 CIGS PV 54 #nm DRAM 54 k dielectric 54 nm nodes 54 SUSS MicroTec 54 scatterometry 54 copper interconnects 54 deep submicron CMOS 53 CMOS fabrication 53 deep submicron 53 X ray microscopy 53 UV LED 53 microbolometers 53 Gallium Nitride 53 BEOL 53 Silicon Carbide 53 SEMATECH 3D 53 Sematech 53 k dielectrics 53 #nm #nm [005] 53 Energetiq 53 CMOS scaling 53 mask optimization SMO 53 TCZ 53 low k dielectrics 53 e beam DFEB 53 #nm CMOS [001] 53 SolarWindow TM 53 ownership CoO 53 wafer thinning 53 PHOLED technology 53 MALDI 52 electrodeposition 52 defectivity 52 EBDW 52 vapor deposition 52 nonpolar GaN 52 GaN 52 photolithographic 52 laser scribing 52 CIGSe 52 antireflective coatings 52 edge roughness LER 52 Plasmonic 52 micro optics 52 productization 52 CIGS solar 52 wafer thickness 52 manufacturable 52 manufacturability 52 FinFET 52 Crolles2 Alliance 52 BrightLase 52 lithography simulation 52 nm CMOS 52 nanoimprinting 52 silicon photonics 52 overlay metrology 52 Mask Aligner 52 Auria Solar 52 SiC 52 k gate dielectric 52 terahertz imaging 52 FDSOI 52 argon fluoride 52 IEDM 51 Obducat 51 ArF immersion 51 OLED lighting 51 carbon nanotube CNT 51 deep sub micron 51 #nm [001] 51 silicon etch 51 pulsed laser deposition 51 nitride 51 CIGS cells 51 mask aligners 51 PECVD 51 Clear Shape 51 nanometer 51 photonic devices 51 Terahertz 51 OLED displays 51 DEK Solar 51 UNCD 51 Silicon Photonics 51 #nm/#nm 51 micromirror 51 SiGen 51 solution processable 51 fluorescence excitation 51 millisecond anneal 51 #nm photomask 51 epitaxy 51 MEMS 51 #nm Buried Wordline 51 CMOS MEMS 51 pellicle 51 amorphous silicon Si 51 Rapid prototyping 51 wafer metrology 51 Complementary Metal Oxide Semiconductor 51 epitaxy HVPE 51 metrology 51 Semiconductors ITRS 51 immersion litho 51 Patterning 51 gate dielectrics 51 microlithography 51 mask aligner 51 sSOI 51 photon detection 51 Richard Brilla CNSE 51 conductive coatings 51 indium gallium arsenide InGaAs 51 HKMG 51 photoluminescence 51 submicron 51 #nm RF CMOS 51 TWINSCAN XT #i 51 temporary wafer bonding 51 micro machining 50 PLED 50 backside illumination 50 extendibility 50 ECPR 50 holographic storage 50 organic photovoltaics 50 Lasertec 50 correction OPC 50 oxide semiconductor 50 flexible monolithically integrated 50 coater developer 50 RRAM 50 vanadium dioxide 50 HfSiON 50 SiON 50 vibrational spectroscopy 50 DUV 50 mm wafer 50 high-k/metal-gate 50 Silicon CMOS Photonics 50 microbolometer 50 chemically amplified 50 indium tin oxide ITO 50 SolarWindow ™ 50 photopolymer 50 PHEMT 50 reticle enhancement 50 SolarWindow 50 QLED 50 silicon interposers 50 DCG Systems 50 HamaTech APE 50 Grätzel cells 50 Tachyon SMO 50 planarization 50 DRIE 50 CIGS solar cells 50 reticles 50 Nanoindentation 50 Spintronics 50 #nm silicon 50 UMC #nm 50 Aerosol Jet 50 Tetra Reticle Clean 50 micromorph 50 photovoltaics PV 50 dielectrics 50 TSMC #nm [001] 50 #nm SOI 50 amorphous silicon 50 hydride vapor phase 50 nanostructured surfaces 50 ellipsometry 50 photopolymers 50 CMP consumables 50 Wafer Bonding 50 #.# micron node 50 nanosilicon 50 millimeter wafer 50 XLR #i 50 nanophotonics 50 MOEMS 50 crystalline Si 50 CMOS 50 plasma etch 50 IKTS 50 optical interconnects 50 VCSEL 50 Raj Jammy 50 Aixtron MOCVD 50 photoresist strip 50 CMOS processes 50 Raman Spectroscopy 50 Gildas Sorin CEO 50 Silicon Via TSV 50 GenISys 50 Nova NanoSEM 50 numerical aperture NA 50 helium ion 50 .# micron 50 nm 50 Tokyo Electron Limited 50 DPSS lasers 49 multijunction solar cells 49 Vertical Cavity Surface Emitting 49 LCOS 49 Wafer Level 49 Brion Technologies 49 Selete 49 CIGS solar cell 49 optical waveguides 49 ReRAM 49 gallium nitride GaN 49 photodetectors 49 nanoengineered 49 quantum dot lasers 49 x ray optics 49 CRIUS 49 furnaceware 49 c Si 49 ultrashort pulse laser 49 ISMI 49 gallium nitride 49 semiconductor lithography 49 conformal coatings 49 HVPE 49 microchannel plate 49 CMOS compatible 49 Litho Forum 49 micromechanics 49 HEMT 49 SUSS 49 MaskTrack Pro 49 pMOS 49 cathode materials 49 fluorescence spectroscopy 49 ion beam 49 FE SEM 49 laser sintering 49 Dektak 49 hafnium oxide 49 SWCNT 49 MOCVD 49 planar transistors 49 ASML TWINSCAN 49 CIGS copper indium 49 Timbre Technologies 49 aluminum nitride 49 imec 49 transparent electrode 49 Productive Nanosystems 49 SiGe bipolar 49 carbon nanotubes CNT 49 Chip Scale 49 bioimaging 49 3D Interconnect 49 copper metallization 49 nanometer silicon 49 parametric yield 49 Crolles2 49 optical spectroscopy 49 defect densities 49 microreactors 49 Crystalline Silicon 49 ASML lithography 49 SiC substrates 49 Amorphous Silicon 49 sub #nm CMOS 49 2G HTS wire 49 fxP 49 WLCSP 49 monolithically integrated 49 #mm wafer 49 conformal 49 LTPS 49 Thin Film Solar 49 nanoindentation 49 nanometrology 49 manufacturability DFM 49 numerical aperture 49 Microfabrication 49 HEMTs 49 UVTP 49 produced plasma LPP 49 AlN 49 InGaN 49 transistor circuits 49 BCDMOS 49 antireflection 49 Phoseon Technology 49 ZMDI 49 optical metrology 49 Innolume 49 Fraunhofer IPMS 49 selective emitter 49 HKMG technology 49 spectroscopic methods 49 nanomanufacturing 49 ion implantation 49 Indium Phosphide 49 oxynitride 49 Miyachi Unitek 49 electron mobility 48 FEOL 48 lithographic techniques 48 transparent conductive 48 DiCon 48 nickel silicide 48 silicon MEMS 48 Silicon Via 48 shearography 48 oxide thickness 48 Flip Chip 48 dielectric materials 48 laser micromachining 48 wide bandgap semiconductor 48 #mm wafers 48 nanocomposite material 48 Nanocomp 48 nitride semiconductor 48 epi wafers 48 Manz Automation 48 #LP [002] 48 ZnSe 48 III nitride 48 indium gallium nitride InGaN 48 photonic integration 48 Nanomanufacturing 48 HamaTech 48 carbon nanotube transistors 48 #nm [002] 48 electron optics 48 ion implant 48 nm immersion lithography 48 #nm MirrorBit 48 electro optic polymer 48 JEOL 48 VECTOR Express 48 Nanoimprint lithography 48 TMOS display 48 poly silicon 48 HORIBA Jobin Yvon 48 VCSELs 48 CPP GMR 48 Nanonex 48 electron beam lithography 48 PVD CVD 48 SpyGlass ® 48 ChemetriQ 48 layer deposition ALD 48 Alchimer 48 ATopTech 48 encapsulant 48 DFM DFY 48 Initiative ISMI 48 photonic crystal 48 MOS transistor 48 Tachyon OPC + 48 Angstron 48 nMOS 48 MOS transistors 48 AFMs 48 LTPS TFT 48 collimating 48 Esatto Technology 48 epiwafers 48 Novaled 48 organic electroluminescent 48 #.# micron CMOS 48 mm wafers 48 inkjet printhead 48 UV LEDs 48 HBLED 48 ASML EUV 48 AMD Fusion APUs 48 silicon substrates 48 Nanometer 48 Imprio 48 LPCVD 48 active matrix OLED 48 Diode OLED 48 nm geometries 48 blue laser diode 48 nm wavelengths 48 Photoresist 48 sputter deposition 48 kit PDK 48 embedded nonvolatile memory 48 phosphorescent OLED technology 48 Konarka 48 irreversible electroporation IRE 48 Quantum Dot 48 MAPPER 48 wide bandgap 48 inkjet printing 48 SOI wafers 48 PHOLED 48 millimeter silicon wafers 48 CdSe 48 graphene transistors 48 QCLs 48 Buried Wordline technology 48 evanescent wave 48 semiconducting nanowires 48 Solamet ® 48 Copper Indium Gallium Selenide 48 TOF TOF 48 XFEL 48 Qcept 48 DSSCs 48 stereolithography 48 through silicon vias 48 InGaAs 48 darkfield 48 Nanochip 48 SIGMA C 48 nanophotonic 48 CNT FED 48 epitaxial structures 48 #.#μm [002] 48 monochromator 48 Advanced Packaging 48 UniFire 48 diodes OLEDs 48 #.#um [001] 48 high voltage BCDMOS 48 deep silicon etch 48 hermetic packaging 48 optical coatings 48 sintering 47 CdTe PV 47 OLED 47 epitaxial 47 CoO 47 Organic Light Emitting 47 Structured ASICs 47 PeakView 47 nanofabrication 47 dye sensitized cells 47 Docea Power 47 Encounter RTL Compiler 47 fiber lasers 47 Gallium nitride 47 Scanning Probe 47 electron beam 47 litho 47 SIMOX 47 Inovys 47 Laurent Malier CEO 47 Toppan Photomasks 47 IQ Aligner 47 algal biofuels 47 dielectric breakdown 47 magnetron sputtering 47 electrowetting displays 47 PZT 47 wirebond 47 silane gas 47 NSR S#C 47 SEMICON West 47 TSMC #nm process 47 CIS CIGS 47 Wafer Level Packaging 47 transistor scaling 47 flexible substrates 47 Electron Beam Lithography 47 NEXX Systems 47 ITRS 47 #nm HKMG 47 sub micron 47 nanocrystal 47 FE DMFC 47 OneChip 47 absorption spectroscopy 47 MEMS NEMS 47 MEMS oscillator 47 structured ASICs 47 HTPS panels 47 nanostructuring 47 copper electroplating 47 semiconductor optoelectronics 47 outcoupling 47 quantum cascade lasers 47 Gallium Arsenide GaAs 47 #nm wavelength [001] 47 NEXX 47 SEMVision G4 47 Calibre LFD 47 High Brightness LEDs 47 holistic lithography 47 DongbuAnam 47 Carbon nanotube 47 millisecond annealing 47 Cadmium Telluride CdTe 47 Beneq 47 BioBacksheet 47 scanning electron microscope SEM 47 MALDI-TOF/TOF 47 ReVera 47 Gallium Nitride GaN 47 Atul Sharan 47 Synopsys DesignWare IP 47 QuantumFilm 47 FotoNation FaceTracker 47 TSMC Hsinchu Taiwan 47 Airborne Particle Sensor 47 #nm fab 47 Morphologi G3 47 ASML immersion 47 TetraMAX ATPG 47 Miniaturization 47 IMEC 47 argon fluoride ArF 47 FeRAM 47 engineered substrates 47 microfabrication 47 NANOIDENT 47 Photovoltaic PV 47 glass substrate 47 reactive ion 47 dye sensitized 47 uniaxial strain 47 dual damascene 47 VHESC 47 nanoelectronic 47 WiCkeD 47 silicon germanium 47 nanoparticle inks 47 SiTime 47 GaN LEDs 47 photodiode 47 Luminescent Technologies 47 electrochemical capacitors 47 MEMS MOEMS 47 Reference Flow 47 BiCMOS 47 Solarmer 47 PolyJet Matrix TM 47 nanometer CMOS 47 Excelitas 47 high temperature superconductivity 47 Osram Opto 47 surface functionalization 47 Extreme Ultraviolet Lithography 47 manganite 47 Amorphous silicon 47 solder bump 47 EMCCD 47 NEDO 47 CIGS thin film 47 photonic integrated circuits PICs 47 multilayer ceramic capacitors MLCC 47 CIGS solar panels 47 ANTARES 47 spectral imaging 47 AMOLEDs 47 phosphorescent OLED 47 FWB SMH GER SMH 47 multiscale 47 OSTAR ® 47 nm CMOS process 47 electromagnetic flowmeter 47 poly Si 47 ISRA VISION 47 polishing pads 47 SOI substrate 47 ARPES 47 CIGS Copper Indium 47 Silicon Solar Cells 47 Sokudo 47 optical microscopy 47 SPIE Photonics West 47 flexible CIGS 47 quantum dot 47 CEA LETI 47 IC Compiler #.# 47 logic LSIs 47 SEMATECH 3D Interconnect 47 Flexible Displays 47 Microdisplay 47 hyperlens 47 nanometer nm 47 Nanolithography 47 Atomic Layer Deposition 47 multiphoton microscopy 47 lithium titanate 47 silicon wafer 47 Semicon 47 planar CMOS 47 FlexUPD 47 SEMATECH FEP 47 tunable RF 47 OTFT 47 FD SOI 46 semiconductor nanowires 46 wafer 46 transistor leakage 46 photoemission 46 linewidths 46 Zenasis 46 epitaxial deposition 46 plasmonics 46 Beamline #.#.# 46 Avancis 46 TM# [002] 46 Suss MicroTec 46 porous silicon 46 flexible OLED displays 46 packaging WLP 46 Nanotube 46 terahertz 46 EDXRF 46 PHOLED lighting 46 sapphire substrate 46 NanoOpto 46 Dye Sensitized Solar Cells 46 low k dielectric 46 AlGaAs 46 ASML 46 lensless 46 planar 46 PEALD 46 #mm MEMS 46 cryogenically cooled 46 semiconductor metrology 46 MEDEA + 46 XDR DRAM 46 nanotechnology MEMS 46 silicon 46 ProFire Excel 46 nanocrystalline silicon 46 cadmium telluride CdTe 46 pHEMT 46 metallisation 46 sapphire wafers 46 CMOS transistors 46 stencil printing 46 silicon germanium SiGe 46 SEMICON Taiwan 46 flexo printing 46 microfocus X ray 46 synchrotron X ray 46 OLED Displays 46 Braggone 46 wide bandgap semiconductors 46 design kits PDKs 46 optical interconnect 46 insulator substrate 46 microelectromechanical system 46 reflectometry 46 Immersion lithography 46 conductive inks 46 UV lasers 46 THz imaging 46 NovaScan 46 lithographic processes 46 nanomanipulation 46 package SiP 46 Nanocyl 46 brightness LED 46 HfO2 46 Arria GX FPGAs 46 CVD diamond 46 Focused Ion Beam 46 chip optical interconnects 46 Chemical Mechanical Planarization 46 nanofilm 46 passivation 46 CMOS photonics 46 AXi 46 subwavelength 46 voltage CMOS 46 DMFC 46 DEV DA TOMAR NEXT 46 Gallium Arsenide 46 SiGe 46 photonic circuits 46 GLOBALFOUNDRIES #nm 46 CdTe 46 geometries shrink 46 IR spectroscopy 46 solder paste 46 ultrafast laser 46 Aviza Technology 46 SOI wafer 46 PolyMax 46 electrophotography 46 carbon nanomaterial 46 ultraviolet laser 46 International Sematech 46 GaN transistor 46 silicon carbide 46 Nitride 46 IMEC Leuven Belgium 46 Fraunhofer ILT 46 nanoparticle synthesis 46 optical cloaking 46 nanoelectronics 46 Fraunhofer ISE 46 nanoworld 46 SAXS 46 photovoltaic module 46 KLA Tencor 46 Docea 46 microelectromechanical systems MEMS 46 semiconductor fabs 46 Phiar 46 Invarium 46 UAlbany NanoCollege 46 Microfluidic 46 International SEMATECH Manufacturing 46 Engineering CNSE 46 QDs 46 MaxEdge 46 Acreo 46 STT RAM 46 TSMC Reference Flow 46 GaN HEMTs 46 CIGS module 46 MEMs 46 Photonic Integration 46 1Gbit DDR2 46 SpecMetrix 46 ultrasonics 46 GaN HEMT 46 Circulating Tumor Cell 46 Silicon Carbide SiC 46 Negevtech 46 D1X 46 AlN substrates 46 Single Wafer 46 active matrix OLEDs 46 crystalline silicon c 46 SOI Silicon 46 flexible OLEDs 46 laser triangulation 46 nm FPGAs 46 Optical Profiler 46 Image Sensors 46 SMT placement 46 Vistec 46 MALDI TOF 46 Kotura 46 nanopillar 46 electron spectroscopy 46 additive fabrication 46 photoresist stripping 46 pulsed lasers 46 gate dielectric 46 HBLEDs 46 QWIP 46 CMOS logic 46 OP# [003] 46 Opti Probe 46 OLED Lighting 46 reconfigurable computing 46 di selenide CIGS 46 UV Visible 46 nonlinear optical 46 photocatalysts 46 ALLVIA 46 etcher 46 SunFab 46 micromachining 46 X ray diffraction XRD 46 silicon foundries 46 LayTec 46 IZM 46 electromigration 46 Kovio 46 SiP 46 metallic interconnects 46 substrates 46 conventional photolithography 46 electrochromic 46 nanofabrication techniques 46 electro optical polymer 46 microfabrication techniques 46 ZnS 46 nanowire transistors 46 Advanced Lithography 46 TWINSCAN 46 encapsulants 46 RF MEMS 46 nanocomposite materials 46 optical microscopes 46 nanoscale characterization 46 CMOS oscillators 46 #μm thick [002] 46 K dielectrics 45 temperature poly silicon 45 Forschungszentrum Dresden Rossendorf FZD 45 Insulator SOI 45 singulation 45 Kopin CyberDisplay 45 Strained silicon 45 microdisplay 45 antimonide 45 silicon nitride 45 projected capacitive touch 45 electron beam welding 45 CMOS ICs 45 picosecond lasers 45 UV2A 45 AFM probes 45 UniPixel 45 MiaSolé 45 Flexfet 45 Maskless 45 Fraunhofer IZM 45 semiconductor nanowire 45 Efficeon TM# 45 Dainippon Screen 45 Synopsys DFM 45 Nextreme 45 nanowire arrays 45 Structured ASIC 45 UV curing 45 Thin Film 45 Metamaterial 45 HB LED 45 diffraction 45 Maskless Lithography 45 Konarka Technologies 45 NovaMARS 45 lithographic patterning 45 ARM#EJ processor 45 #μm [001] 45 semiconductor nanostructures 45 holography 45 AlSiC 45 microdevices 45 Vistec Lithography 45 high-k/metal gate HKMG 45 Eudyna 45 Superlattice 45 Photonic crystals 45 biochips 45 KrF 45 Carbon Nanotube 45 Nanocrystals 45 femtosecond pulse 45 Heliatek 45 TiN 45 Nemoptic 45 Nanoscale 45 GaN transistors 45 Solibro 45 spintronic 45 optically transparent 45 Microfabrica 45 polycarbonate glazing 45 tunable filters 45 JTAG Boundary Scan 45 J#Ex 45 GX# [003] 45 micromechanical 45 parasitic inductance 45 thermoelectric materials 45 High Brightness LED 45 parametric testers 45 PANalytical 45 Plasmonics 45 superconducting materials 45 Crolles France 45 photoconversion 45 Xpedion 45 semiconductor fabrication 45 Alanod Solar 45 Ultra wideband 45 Dimatix 45 AMLCD 45 Nanosensors 45 reflow soldering 45 Silicon Clocks 45 laterally diffused metal 45 Ziptronix 45 microelectronic packaging 45 laser diode module 45 Scanning Probe Microscope 45 superlenses 45 Xenics 45 Aluminum Nitride 45 Remcom 45 Scanning Probe Microscopy 45 Imec performs world 45 GaAs HBT 45 solariX 45 Nanowire 45 FT IR 45 Human Proteome Organization 45 Nanostellar 45 Cree GaN 45 nano coatings 45 plasma etching 45 GaAs MMICs 45 ultrahigh resolution 45 SensArray 45 solar concentrator 45 solder bumping 45 Metrology System 45 LDMOS 45 wafer probing 45 BridgeLux 45 DBEF 45 backside illumination BSI 45 concentrating photovoltaics 45 deconvolution 45 microfluidic devices 45 organic TFTs 45 Organic light emitting 45 chalcogenide 45 Femtosecond